Performance Analysis of Double Gate Dielectric Modulation in Schottky FET as Biomolecule Sensor

نویسندگان

چکیده

In this article, a charge-plasma (CP)-based double gate schottky barrier FET structure has been investigated using dielectric controlled biomolecule sensor. The use of Hafnium as charge plasma at the source side encourages an n + in un-doped silicon region, which expressively decreases Schottky thickness. oxide below Metal M1 and M2 is etched out to create nanogap openings for finding. Here, existence molecules categorized by modification material inside related densities, hence, controls tunneling thickness Metal-source-silicon channel interface, also with help charges intrinsic-Si film. This paper mainly focused on fundamental physics proposed approximations their relative sensitivity detecting enactment. sensing enactment assessed charged biomolecules charge-neutral widespread device simulation, special properties biomolecule. improves its control over region used sensing, ensuing larger on-state drain current (Ids) Hence, voltage recognised active design parameters efficient reduction. Moreover, SB FET-based biosensor threshold (Vth), abnormality on-current (Ion), Ion/Ioff ratio shown. Also, simulations calibrated experimental results. change Ion maintain improved ability recognition.

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Double-Gate Tunnel FET With High-κ Gate Dielectric

In this paper, we propose and validate a novel design for a double-gate tunnel fi eld-effect transistor (DG Tunnel FET), for which the simulations show significant improvements compared with single-gate devices using an SiO2 gate dielectric. For the fi rst time, DG Tunnel FET devices, which are using a high-κ gate dielectric, are explored using realistic design parameters, showing an ON-current...

متن کامل

Channel thickness dependency of high-k gate dielectric based double-gate CMOS inverter

This work investigates the channel thickness dependency of high-k gate dielectric-based complementary metal-oxide-semiconductor (CMOS) inverter circuit built using a conventional double-gate metal gate oxide semiconductor field-effect transistor (DG-MOSFET). It is espied that the use of high-k dielectric as a gate oxide in n/p DG-MOSFET based CMOS inverter results in a high noise margin as well...

متن کامل

Hetero double gate-dielectric Tunnel FET with record high ION /IOFF ratio

To manage the increasing static leakage in low power applications and reduced Ion/Ioff due to aggressive scaling of MOS transistors, Tunnel FET (TFET) devices are considered as the most promising candidates because of their excellent immunity against such important short channel effects. Solutions for leakage reduction as well as improving on current of the device are sought at the device desig...

متن کامل

Performance Analysis of Double Gate n-FinFET Using High-k Dielectric Materials

To extend the use of CMOS technology beyond 14 nm node technology, new device materials are required that can enhance the performance of MOSFETs. The use of high-k materials in double gate (DG) MOSFET can triumph over the problem of power dissipation and leakage current. In this paper, we investigated various high-k dielectrics as the gate oxides in a 12 nm SOI FinFET and the performance potent...

متن کامل

Gate Modulation of Graphene-ZnO Nanowire Schottky Diode

Graphene-semiconductor interface is important for the applications in electronic and optoelectronic devices. Here we report the modulation of the electric transport properties of graphene/ZnO nanowire Schottky diode by gate voltage (Vg). The ideality factor of the graphene/ZnO nanowire Schottky diode is ~1.7, and the Schottky barrier height is ~0.28 eV without external Vg. The Schottky barrier ...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Silicon

سال: 2021

ISSN: ['1876-9918', '1876-990X']

DOI: https://doi.org/10.1007/s12633-021-01197-y